TELECOMMUNICATIONS AND RADIO ENGINEERING - 2010 Vol. 69,
No 4 		 

 

 

 

Application of Focused Charge-Particle Beams of in Manufacturing of Nanocomponents


G.S. Vorobyov, À.À. Ponomareva, À.À. Drozdenko, & À.À. Rybalko
Sumy State University, 2 Rymski-Korsakov St., Sumy, 40007, Ukraine
Address all correspondence to G.S. Vorobyov E-mail: vp@sumdu.edu.ua

À.G. Ponomarev
Institute of Applied Physics, 58, Petropavlovskaya St., Sumy, 40030, Ukraine

Abstract
Application of focused beams of medium energy light ions, electrons and low energy heavy ions is considered for the technology of manufacturing of small-dimension components. Physical principles applied as the basis for interaction of the above beams with resistive materials are described. The proton beam lithography is considered as a new technology possessing high potential capabilities for various applications like micro-optics and nanoelectronics of terahertz wave band.

KEY WORDS: manufacturing, focused beam, nanoelectronics, beam litography



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pages 355-365

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